SP3 Diamond CVD coating
Diamond film formation by HFCVD method
Achieving long life of components by imparting wear resistance to them
By forming a diamond film consisting of more than 99% SP3 structure by the HFCVD method and imparting high wear resistance and chemical resistance to the components, the long life of the components is realized. There are many coating records for cutting tools and mechanical seals.
For semiconductor applications, there are coating records for consumables such as Si rings attached to semiconductor manufacturing equipment (etching, CVD equipment, etc.).
In the CMP process, diamond coating on the CMP pad conditioner prevents the conventional problem of diamond particle detachment
We offer two types of coatings with different crystal grain sizes (MCD/NCD).
MCD: MCD has a larger crystal grain size, typically growing 10-30% of the thickness in all directions (X, Y, Z).
NCD: NCD has a smaller crystal grain size, growing 3-10% of the thickness mainly in the Z direction by epitaxial growth.
